GB/T 29505-2013 in English

VALID

Test method for measuring surface roughness on planar surfaces of silicon wafer

Issued on:2013-05-09
Implemented on:2014-02-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $430.00
$418.00

Standard No:	GB/T 29505-2013
Document status:	VALID
Title in English:	Test method for measuring surface roughness on planar surfaces of silicon wafer
Title in Chinese:	硅片平坦表面的表面粗糙度测量方法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2013-05-09
Implemented on:	2014-02-01
ICS Classification:	29.045-Semiconducting materials
Chinese Classification:	H80-Semimetal and semiconductor material in general
Professional Classification:	GB-National Standard
Related Keywords:	silicon wafer surface surface roughness flat silicon wafer roughness measurement wafer edge area
Related Topics:	Surface roughness silicon wafer surface energy Surface energy measurement roughness Silicon Surface Inspection Steradian measurement wafer surface peak Roughness measurement Surface Roughness Leakage Steradian measurement Surface Test Method Microdisc how to measure surface energy How to measure surface roughness Surface Roughness Measurement table surface low energy surface Surface energy measurement Silicon sphere surface Surface table surface flux Surface roughness n7 Sphericity measurement method Roughness of the film surface surface table How to measure surface roughness Dongfang Surface Roughness Meter Flatness Measuring Instrument surface roughness on material surface Surface Roughness Meter What kind of film is used for rough surface n7 surface roughness Sphericity measurement method Surface Roughness of Sputtering Target Roughness detection Surface Roughness Instrument Steradian measurement How to measure roughness Roughness measurement water silicon surface Surface Viscosity Measurement Method Specific surface energy measurement Roughness measurement method rough surface Gold surface energy measurement Orient Roughness Measurement rough balance surface potential gradient How to measure roughness Material Surface Measurement Methods Optical Surface Roughness Measurement GBT29505 GB/T 29505-2013 Silicon Wafer Line Mark and Roughness How to use surface roughness samples What are the flatness measuring instruments? Mitutoyo surface roughness measuring instrument Roughness measurement report Owens two-liquid method for measuring surface energy One-sided pockmarked noodles Pneumatic plane meter flatness Illustration of flatness measurement method Test methods for handheld roughness meters Roughness processing method Methods to detect alloy surface flatness Roughness processing method Measurement method of plane straightness How to measure the thickness of a screen Roughness processing method Flatness measurement methods and detection tools Surface energy measurement method of solids Detection method of workpiece flatness Plastic surface flatness measurement method Surface roughness processing method Part flatness detection method How to test surface flatness Gain Flatness Measurement Method Substrate surface roughness measurement Release film roughness measurement method Flatness and Parallelism Measurement Methods Methods for measuring the roughness of curved surfaces Coating surface roughness testing Evaluation of surface roughness Surface roughness of plastic parts Evaluation method of flatness Simple measurement method of flatness Rubber parts surface roughness Measurement method of trace amounts of silicon Test method for surface flatness Roughness detection method after sand blasting Plane flatness measurement method Rubber product surface roughness Elco rubbing roughness meter measurement method Silicon wafer surface film Flatness testing methods and techniques Flatness detection method Surface roughness measurement method Coating film roughness measurement method Product national standard measurement flatness requirements Flour thickness measurement method Silicon powder content on silicon wafer surface Simple measurement method of roughness Surface flatness detection method Surface roughness evaluation Characterization methods of silicon quantum dots Surface roughness testing method Method for determination of surface bile acid density What are the methods for measuring surface bile acid density? Infrared Plane Metrics Measurement Method gbt29505-2013

《GB/T 29505-2013硅片平坦表面的表面粗糙度测量方法》由TC203（全国半导体设备和材料标准化技术委员会）归口，主管部门为国家标准化管理委员会。

Scope

This standard provides the measurement principle, measurement equipment and procedures of the three methods commonly used in the measurement of the surface roughness of silicon wafers: profilometer, interferometer and scatterometer, and specifies the standard scanning position pattern and roughness of the local or entire area of the silicon wafer surface. Abbreviation definition. This standard applies to the roughness measurement of the surface of the flat silicon wafer; it can also be used for other types of flat wafer materials, but it is not applicable to the roughness measurement of the wafer edge area. This standard does not apply to measuring instruments with bandwidth spatial wavelength ≤ 10 nm.

More samples: GB 50021-2001(2009) JGJ 94-2008 QC/T 942-2021

Sample only — not a preview of GB/T 29505-2013

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