GB/T 1552-1995 in English
SUPERSEDEDTest method for measuring resistivity of monocrystal silicon and germanium with a collinear four-probe array
- Issued on:1995-04-18
- Implemented on:1995-01-02
- File Format:PDF
- Delivery:Via email within 1~3 business days
$233.00
《GB/T 1552-1995硅、锗单晶电阻率测定 直排四探针法》由TC203(全国半导体设备和材料标准化技术委员会)归口,主管部门为国家标准化管理委员会。
本标准规定了用直排四探针测量硅、锗单晶电阻率的方法。本标准适用于测量试样厚度和从试样边缘与任一探针端点的最近距离二者均大于探针间距的4倍的硅、锗单晶的体电阻率以及测量直径大于探针间距的10倍、厚度小于探针间距4倍的硅、锗单晶圆片(简称圆片)的电阻率。
Scope
This standard specifies the method for measuring the resistivity of silicon and germanium single crystals with four in-line probes. This standard is applicable to the volume resistivity of silicon and germanium single crystals whose thickness and the shortest distance from the edge of the sample to any probe end point are both greater than 4 times the spacing between the control pins, and for which the diameter is greater than the spacing between the probes. 10 times the resistivity of silicon and germanium single wafers (referred to as wafers) whose thickness is less than 4 times the pin spacing. The measurement range is silicon: 1×10-3~3×103Ω·cm, germanium: 1×10-3, 1×102Ω·cm .

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