GB/T 39865-2021 in English
VALIDMethod for measuring refractive index of uniaxial optical crystals
- Issued on:2021-03-09
- Implemented on:2021-10-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$156.00
《GB/T 39865-2021单轴晶光学晶体折射率测量方法》由TC461(全国人工晶体标准化技术委员会)归口,主管部门为中国建筑材料联合会。
Introduction
Technical Background of the Standard
With the development of cutting-edge fields such as laser technology and quantum communication, the precise measurement of the refractive index of uniaxial optical crystals has become a key link in material characterization. This standard fills the gap in the standardization of high-precision refractive index measurement methods at the 10-6 level in my country.
Core measurement principle
| Parameters | o light measurement | e light measurement |
|---|---|---|
| Calculation formula | no=sin io/sinθ | ne=sin ie/sinθ |
| Refraction angle determination | Large angle of positive uniaxial crystal | Large angle of negative uniaxial crystal |
| Source of uncertainty | Instrument error (0.000001), repeated measurement error | |
Key implementation requirements
Sample preparation specifications
- Geometric dimensions: 10-20mm right-angle prism, vertex angle 10°-35°
- Surface accuracy: incident/exit surface better than 0.2λ (λ=632.8nm)
- Optical axis orientation: angle with the normal of the incident surface ≤5′
Typical operation case
Take the measurement of α-BBO crystal as an example: it is necessary to first perform environmental equilibration for 5 hours, use a 532nm laser light source, and take the average value of 6 repeated measurements. The final refractive index should be expressed as ne=1.6753±0.000002(k=2).
Uncertainty control
The combined uncertainty is calculated using the formula un=√(∑(nn)2/[N(N-1)]+u122), where:
- Type A uncertainty: introduced by repeated measurements, N≥6 is recommended
- Type B uncertainty: provided by equipment calibration certificate
Industry application recommendations
- Laser device manufacturers should establish a constant temperature measurement environment of 21℃±3℃
- Scientific research institutions need to regularly calibrate the measurement system with standard quartz samples
- Crystal growth units should control processing stress <0.5MPa

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