GB/T 5238-2019 in English

National Standard of the People's Republic of China GB/T 5238—2019

Ge Single Crystal and Ge Single Crystal Wafer

Foreword

This standard was drafted in accordance with the rules given in GB/T1.1-2009 and replaces GB/T5238—2009. The main technical changes include revising the scope of application, adding terms and definitions, and updating the brand representation method and testing requirements.

Comparison of standard frameworks

Old version GB/T5238—2009	New version GB/T5238—2019
Scope of application: epitaxial substrates	Scope of application: infrared optical components
Terms and definitions: unclear	Terms and definitions: newly added
Grade representation method: old version rules	Grade representation method: updated to GB/T14844

Analysis of standard formulation background and technological evolution

With the development of semiconductor devices and infrared optical technology, the new version of the standard introduces requirements for non-doped germanium single crystals, adjusts the resistivity range, and adds new surface quality inspection indicators. These changes reflect the industry's increased demand for material performance.

Implementation Recommendations

1. Enterprises should update testing equipment and methods: Ensure compliance with the requirements of new referenced standards such as GB/T 26074.
2. Strengthen the quality control system: Especially in terms of surface quality and crystal integrity, it is recommended to introduce automated testing equipment to improve efficiency.
3. Train relevant personnel: Focus on training on new terminology, brand name representation methods and changes in testing processes.